Optical and EUV Lithography: A Modeling Perspective
| Autor principal: | |
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| Formato: | Recurso Electrónico livro electrónico |
| Idioma: | English |
| Publicado em: |
SPIE,
2021
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| Assuntos: | |
| Acesso em linha: | Full text available on SPIE Digital Library Off-campus access |
| Descrição do item: | <strong>Off-Campus Access:</strong> Athens ID and Password Required <strong>On-Campus Access:</strong> No User ID or Password Required |
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| Descrição Física: | 1 online resource |
| Formato: | Mode of access: Internet |
| ISBN: | 9781510639010 9781510639027 |
| DOI: | 10.1117/3.2576902 |
| Acesso: | Electronic access restricted to authorized BRAC University faculty, staff and students |