Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology

Bibliografiske detaljer
Andre forfattere: Ando, Akihiko
Format: Electronisk Bog
Sprog:English
Udgivet: SPIE Digital Library, 7/9/19
Fag:
Online adgang:Full text available on Research4Life (SPIE Digital Library)
Classic Catalogue: View this record in Classic Catalogue
Beskrivelse
Emne beskrivelse:<strong>On-Campus Access Only (IP based access)</strong>
Fysisk beskrivelse:1 online resource
Format:Mode of access: Internet
ISBN:9781510630734
9781510630741
Adgang:Electronic access restricted to authorized BRAC University faculty, staff and students